Joseph Tepper

Joseph Tepper 1886-1977 was a Russian, Jewish, American portrait painter and artist.[1]

He was born in Mezhirichi, but grew up and was educated in Odessa. In about 1905, he moved to Paris where he got his first formal training as an artist. He returned to Russia about the time of the start of the first World War and was living in Moscow during the Russian Revolution. He left Russia for good in 1921 and moved first to what was then the British Mandate of Palestine, then to Egypt, and finally to the United States where he lived in Boston, New Orleans, and Honolulu before retiring in Mexico.[citation needed]

He was an active portrait painter well into his 70s and many famous people were among his subjects including Justices Brandeis and Frankfurter of the US Supreme Court, Professors George Lyman Kittredge and Paul Freund of Harvard University, Cardinal Stritch, Yitzhak Ben-Zvi, Hayim Bialik, Ahad Ha-Am, Henrietta Szold, and many more.[citation needed]

References

  1. ^ Koltun-Fromm, Ken (21 April 2010). Material Culture and Jewish Thought in America. Indiana University Press. ISBN 978-0-253-00416-1.

Content Disclaimer

Informasi ini disarikan dari Wikipedia dan disajikan kembali untuk tujuan edukasi. Konten tersedia di bawah lisensi CC BY-SA 3.0. Kami tidak bertanggung jawab atas ketidakakuratan data yang bersumber dari kontribusi publik tersebut.

  1. The information displayed on this website is sourced in part or in whole from Wikipedia and has been adapted for the purpose of restating it. We strive to provide accurate and relevant information, however:
  2. There is no guarantee of absolute accuracy. Wikipedia is an open, collaborative project that can be edited by anyone, so information is subject to change.
  3. It is not intended to constitute professional advice. The content displayed is for informational and educational purposes only. For important decisions (e.g., medical, legal, or financial), please consult a professional.
  4. Content copyright. Wikipedia is licensed under the Creative Commons Attribution-ShareAlike License (CC BY-SA). This means that content may be reused with appropriate attribution and shared under a similar license.
  5. Responsible use. Any risk arising from the use of information from this website is entirely the responsibility of the user.