Draft:Bacus

  • Comment: Multiple copy and pastes without the appropriate quoting or attribution. In total, I estimate around one-third of this article is copied content. Additionally, there is still no evidence of notability in this article for this topic, as nearly all of the sources are published in journals for the article or are other brief mentions of the topic. aaronneallucas (talk) 21:29, 3 December 2025 (UTC)
  • Comment: Well done on creating the draft, and it may potentially meet the relevant requirements (including WP:GNG, WP:NCORP) but presently it is not clear that it does.
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BACUS
Founded1980
TypeProfessional organization
FocusPhotomask Technology

BACUS (originally Bay Area Chromium Users Society) is a photomask-industry technical organization and conference community associated with semiconductor mask making. It began in Silicon Valley in the early 1980s as a forum for mask users, mask makers, materials suppliers, and equipment vendors. The first BACUS symposium was held in Sunnyvale, California, on March 9, 1981. Participants from semiconductor manufacturers, mask shops, and photomask-related suppliers in the United States and Japan attended that first meeting.[1]

Contemporary organizing memos show that the name “Bay Area Chrome Users Society” was adopted at a January 13, 1981 meeting and that the first BACUS conference was scheduled for March 9, 1981, at the Sunnyvale Hilton, focused on functional and analytical qualification of high-quality chrome blanks.

BACUS is a Technical Group of SPIE, the International Society of Optics and Photonics. It supports the development of photomask technologies used in semiconductor manufacturing, primarily through technical conferences to disseminate advances in photolithography as part of the Photomask Technology and EUV Lithography ("PUV") Symposium.[2]

History

The early BACUS meetings focused on practical problems in photomask production, including chrome mask blanks, mask defects, chrome adhesion, photoresists, embedded defects, functional testing, mask cleaning, and vendor-user communication. The 1982 symposium was held in Santa Clara, California, on June 8–9, 1982, and member companies including American Microsystems, Fairchild Semiconductor, Hewlett-Packard, IBM, Intel, KLA Instruments, Micromask, National Semiconductor, Raytheon Semiconductor, Siltec, and Ultratech attended.[3]

The 1983 symposium, also held in Santa Clara, included a keynote on future trends in mask making, a panel discussion on reticle issues for 1×, 5×, and 10× systems, and technical papers on VLSI mask making, reticle inspection, quartz substrates, and electron-beam resist performance.

A 1992 editorial by Steve Dunbrack in BACUS News described the origins of the group as a series of meetings among Bay Area mask makers concerned with chrome blank quality. Dunbrack wrote that the group began meeting in 1979, that Jim Wiley suggested holding a symposium with chrome blank vendors, and that the name "Bay Area Chrome Users Society" was coined at a planning meeting in December 1980. A later first-person account in BACUS News similarly described informal Bay Area mask maker meetings during the 1970s and the organization of an initial symposium around common problems with chrome blanks, including uniformity, flatness, and defects.[1][4][5]

Symposium and technical role

By the 1990s and 2000s, BACUS had become the annual conference at which product announcements were made in the photomask industry. The same report said the 2004 meeting focused on 65-nm mask technology and brought together nearly 1,000 people to discuss mask-making issues. Trade publications used BACUS as a venue for reporting developments in advanced lithography, photomasks, mask inspection, computational lithography, and design-for-manufacturing.[6][7][8][9]

In 1994, 1997, and 1998, advanced laser photomask writing system had been announced by IBM. [10][11][12]

In 2002, several international vendors (ASML, Leica, Motorola, Photronics, Schott, Unaxis, Veeco and others) claim to have "demonstrated a 9-inch reticle production capability" over existing 6-inch reticles used at the time.[13]

In 2003, mask yield under 30% was the topic of concern, where defects "represented 50 percent of all yield loss" according to Walter Trybula, a senior fellow at Sematech, a chip-making consortium, based in Austin, TX, and Kurt Kimmel, mask strategy program manager at IBM.[14][15]

In 2004, a BACUS panel of mask-makers and users alike discussed whether 193 nm "immersion was ready to replace 157 nm dry lithography." The panel included local and international representatives from Mentor Graphics, Advanced Mask Technology Center, AMD, TSMC, Toshiba and Photronics.[16] Mark LaPedus reported in ''Silicon Strategies'' from the BACUS Symposium for Photomask Technology in Monterey, California, writing that equipment makers and electronic-design-automation vendors warned of a widening communication gap among IC design, photomask making, and wafer fabrication.[17]

In 2005, traditional Electronic Design Automation (EDA) vendors voiced their concerns in Design for Manufacturing (DFM). An increase in attendance by fabless companies was also noted.[18][19] Synopsys and Voltaire highlighted the optimal InfiniBand configuration.[20]

The conference also served as a venue for discussion of design-for-manufacturing and computational lithography. In September 2007, first multi-beam writing results were presented at the photomask conference in Monterey by IMS Nanofabrications. This sparked the interest of US semiconductor company Intel Corporation.[21] 2007 ''Semiconductor Digest'' reported that Brion Technologies announced dual-dipole and custom-illumination computational-lithography tools at the BACUS Symposium on Photomask Technology and Management in Monterey.[22] Another 2007 Semiconductor Digest report, “Doubling down at BACUS,” described mask makers gathered in Monterey for the annual BACUS Symposium on Photomask Technology and discussed double-patterning technology as a likely path for upcoming semiconductor technology nodes.[9]

BACUS-related reporting later covered EUV lithography, nanoimprint lithography, direct-write e-beam, mask inspection, mask metrology, and reticle contamination. In 2009, ''Semiconductor Digest'' reported from the SPIE/BACUS photomask technology conference in Monterey on nanoimprint lithography and patterned media.[23]

Lithography author Chris Mack has also described BACUS as a continuing conference community. In a 2009 conference diary, Mack described the Monterey meeting as the 29th annual BACUS Photomask Technology Conference and explained the BACUS acronym as “Bay Area Chrome Users Society.”[24]

At a BACUS conference in 2010, members of the eBeam Initiative, a group of 34 companies including Synopsys Inc., Abeam Technologies Inc., EQUIcon Software GmbH Jena and Tool Corp, discussed "a design-to-manufacturing approach known as design for e-beam (DFEB) to reduce mask costs."[25]

In 2014, Semiconductor Digest reported that the Photomask Technology conference included more than 70 presentations covering mask making, EUV, 9-inch glass, emerging mask technologies, and related photomask topics.[26]

Actinic Mask Inspection was first announced by Lasertec Corporation in 2018.[27] VISTEC presented new e-beam lithography system and data preparation solutions in 2024.[28] Siemens delivered an invited talk on high-NA stitching in 2025, which was jointly presented with IMEC and KLA. [29]

At a BACUS conference in 2025, the eBeam Initiative reported the results of its 14th annual eBeam Initiative Luminaries survey where "industry luminaries representing 51 companies from across the semiconductor ecosystem—including photomasks, electronic design automation (EDA), chip design, equipment, materials, manufacturing and research” participated."[30]

The original BACUS Symposium evolved into the SPIE Photomask Technology Conference and was later co-located with the EUV Lithography Conference, together referred to as the SPIE PUV Symposium. The event remains one of the main international venues for research on photomasks, inspection, metrology, and lithography.[31][32]

Contemporary sources continue to describe the Photomask Technology + EUV Lithography (PUV) Symposium—historically associated with BACUS—as a "key annual event" for global photomask research.[33] [34]

Awards

BACUS issues several awards annually.[35] Awards and a selection of recipients are listed below.

  • Lifetime Achievement Award - To recognize an individual who, during their lifetime, have made distinct contributions of business or technical significance to the photomask industry.
Year Name Citation Ref
2008 David Markle "Considered to be one of the founders of the lithography field, was presented with the Photomask Lifetime Achievement Award" [36]
2009 Barry Hopkins, CEO and cofounder of RAVE LLC For his "vision in the mask repair equipment arena, lauding his role in providing a yield-improvement pathway and a tremendous cost-saving advantage to advanced mask makers around the world." [37][38][39]
2010 Brian Grenon, Grenon Consulting, Inc. "In recognition of his various contributions to the Photomask industry; specifically to haze characterization, photomask process development, and photomask process education." [40]
2012 Richard Ole Larson of Toppan Photomask In recognition of "his leadership, mentoring, and operations excellence as well as general contributions to the photomask industry." [41]
2013 Deno Macricostas, founder of Photronics "For his dedication to customer service, strategic acquisitions and partnerships." [42]
2014 Jim Wiley, of ASML "In recognition of contributions to the industry, particularly in the area of photomask defect characterization, printability, and publication." [43]
2017 Dr. Hiroaki Morimoto of Mitsubishi Electronics "Highlights of his work include the ion beam repair system that was commercialized by Seiko Instruments and the invention of the attenuated phase-shifting mask with a single-layer absorptive shifter which is still used in production." [44]
2018 Frank Abboud "For his thirty+ years of significant contributions in all areas of photomask technology, more specifically for his leadership in the development of advanced e-beam pattern generation." [44]
2019 Uwe Behringer of UBC Microelectronics "In recognition of his promotion and support of the photomask industry over many decades through his efforts to plan and organize The European Mask and Lithography Conference and his unflagging contribution to the Photomask Technology and Photomask Japan conference." [44]
2021 Ken Rygler of Rygler and Associates "For influencing the entry of the E.I. Dupont Company into the merchant mask business in the 1980's." [45][46]
2024 Hans Loeschner of IMS Nanofabrication "In recognition of his contributions toward the development of the IMS electron multi-beam mask-writer (MBMW) technology." [47]
  • BACUS Award - To recognize contributions to the photomask industry that have at least one of the following attributes: a fundamental change or innovation, an enduring contribution, and/or an enabling contribution.
    • 1998: Shoichiro Yoshida of Nikon[48]
    • 2013: Tadahiro Takigawa of ASML Japan[42]
    • 2014: Dan Meisburger of Tec-Start Consulting[43]
    • 2017: Dr. Hans Loeschner and Dr. Elmar Platzgummer of IMS Nanofabrication[44]
    • 2018: Tsuneo Terasawa and Hidehiro Watanabe of Lasertec[49]
    • 2023: Haruhiko Kusunose of Lasertec in recognition of "The enablement of EUV mask inspection using 193nm optical inspection system"[50]
  • BACUS Best Presentation- To recognize an oral presentation and research, this recognition is awarded at the chairs' discretion, typically by committee vote. Presentations are judged on three criteria: technical impact, scientific analysis, and delivery/presentation.
Year Name Title Source
1998 Gordon, Ronald L and Chris A. Mack Design and analysis of manufacturable alternating phase-shifting masks [51][52]
2005 A. B. Kahng and I. I. Mandoiu Yield-Driven Multi-Project Reticle Design and Wafer Dicing [53]
2008 Emily E. Gallagher Wafer plane inspection evaluated for photomask production [54]
2010 Tom Faure and Karen Badger Development and Characterization of a Thinner Binary Mask Absorber for 22 nm node and Beyond [55]
2011 Michael S. Hibbs Evaluation of the Accuracy of Complex Illuminator Designs [56]
2012 Mahesh Chandramouli and Frank Abboud Future Mask Writers Requirements for the Sub 10 nm Node Era [57]
2014 Frank E. Abboud and Michael Asturias Mask Data Processing in the Era of Multibeam Writers [58]
2015 Dario L. Goldfarb Fabrication of a full size EUV pellicle based on silicon nitride [59]
2018 Scott Lewis Design and implementation of the next-generation electron-beam resists for the production of EUVL photomasks [60]
2021 Kan Zhou and Xin Guo Characterization of mask CD mean-to-target for hotspot patterns by using SEM image contours [61]
2022 Abhishek Shendre and Aki Fujimura You Don’t Need 1nm Contours for Curvilinear Shapes: Pixel-Based Computing is the Answer [62]
2023 Toshiyuki Todoroki and Kou Gondaira Actinic pattern mask inspection for high-NA EUV lithography [50]

Publications

Conference Proceedings[63] are published by SPIE and cover a wide range of topics in photomask technology. SPIE also archives BACUS newsletters published from 2010-2023.[44]

  • Connecting climate with photomasks: Using skills for good by Emily Gallagher of Imec[64]
  • Translating e-beam-litho performance to optical specification by Vistec Electron Beam[65]

References

  1. ^ a b Wiley, Jim (October 29, 2018). "Early Silicon Valley Mask Making & BACUS Founding". Medium. Retrieved April 25, 2025.
  2. ^ "SPIE BACUS Technical Group". spie.org. Retrieved 2025-04-10.
  3. ^ BACUS. "Bay Area Chrome User Society" (PDF). Bay Area Chrome User Society: "pdf".
  4. ^ Computer History (October 19, 1987). "Semiconductor industry conference" (PDF). Semiconductor industry conference.
  5. ^ Computer History. "Semiconductor Industry Conference" (PDF). Semiconductor Industry Conference.
  6. ^ "BACUS symposium goes strong, despite downturn". go.gale.com. Retrieved 2026-06-01.
  7. ^ "Photomask renaissance predicted at BACUS '96 | Norddjurs Biblioteker". norddjursbib.dk (in Danish). Retrieved 2026-06-01.
  8. ^ LaPedus, Mark (2016-09-22). "5 Takeaways From BACUS". Semiconductor Engineering. Retrieved 2026-06-01.
  9. ^ a b "Doubling down at BACUS". Semiconductor Digest. October 2007.
  10. ^ IBM (December 1, 1994). "Improved excimer laser pattern generator for photomask fabrication".
  11. ^ IBM (December 1, 1997). "Mask technology for excimer laser projection ablatio".
  12. ^ IBM (September 16, 1998). "Implementation and performance of a femtosecond laser mask repair system in manufacturing".
  13. ^ LaPedus, Mark (2002-10-01). "Is the IC industry ready for a new photomask size?". EE Times. Retrieved 2025-02-07.
  14. ^ LaPedus, Mark (2003-09-12). "Photomask yields become a growing crisis, say experts". EE Times. Retrieved 2025-07-07.
  15. ^ Lapedus, Mark (2003-09-12). "Photomask yields a growing crisis, experts warn". EDN. Retrieved 2025-07-07.
  16. ^ EETimes (2004-02-25). "Bacus panel wrings out immersion lithography". EE Times. Retrieved 2025-07-07.
  17. ^ LaPedus, Mark (September 20, 2004). "Counterpoint: new class of DFM engineers wanted". EE times.
  18. ^ McGrath, Dylan (2005-10-07). "Design, manufacturing worlds collide at Bacus". EDN. Retrieved 2025-06-05.
  19. ^ McGrath, Dylan (2005-10-07). "Design, manufacturing worlds collide at Bacus". EE Times. Retrieved 2025-06-19.
  20. ^ "Voltaire and Synopsys Introduce High-Performance Compute Solution to Reduce Cycle Time for Semiconductor Mask Manufacturing". Synopsys News Releases. Retrieved 2026-06-01.
  21. ^ "History". IMS Nanofabrication GmbH. Retrieved 2026-06-01.
  22. ^ Levenson, M. David (September 2007). "Brion debuts tools for dual dipole and custom illumination". Semiconductor Digest.
  23. ^ "SPIE/BACUS: NIL in patterned media…but when for ICs?". Semiconductor Digest. September 2009.
  24. ^ Mack, Chris (2009). "Making Masks in Monterey". Lithoguru.
  25. ^ McGrath, Dylan (2010-09-23). "The horror of 80-hour photomask write times". EE Times. Retrieved 2025-07-07.
  26. ^ Solid State Technology (October 2014). "Photomask Technology speaker says EUV is nearly production ready". Semiconductor Digest.
  27. ^ Lasertec. "Lasertec published a technical paper at BACUS 2018 regarding a development of Actinic Patterned Mask Inspection for EUVL". Lasertec Corporation. Retrieved 2026-06-01.
  28. ^ Vistec (2024-09-24). "Meet us at Bacus Photomask Technology 2024 in Monterey, CA". www.vistec-semi.com. Retrieved 2026-06-01.
  29. ^ Siemens (2026-01-29). "Calibre IC Manufacturing in 2025: The year's biggest news - Calibre IC Design & Manufacturing". Retrieved 2026-06-01.
  30. ^ Willis, Jan (2025-10-27). "Expert Panel Sees History Of Continuous Photomask Innovations As Key To The Future". Semiconductor Engineering. Retrieved 2025-11-18.
  31. ^ Levinson, Harry (September 18, 2024). "Conferences on Mask Technology". Journal of Micro/Nanopatterning, Materials, and Metrology. 23 (3): 030101. Bibcode:2024JMNMM..23c0101L. doi:10.1117/1.JMM.23.3.030101.{{cite journal}}: CS1 maint: article number as page number (link)
  32. ^ Willis, Jan (2017-08-17). "What's Changing At BACUS". Semiconductor Engineering. Retrieved 2025-04-10.
  33. ^ Levinson, Harry (2024-12-04). "Takeaways From The 2024 SPIE Photomask Technology + EUV Conference". Semiconductor Engineering. Retrieved 2025-04-24.
  34. ^ Maire, Robert (2024-10-08). "SPIE Monterey- ASML, INTC - High NA Readiness- Bigger Masks/Smaller Features". Semiwiki. Retrieved 2025-10-06.
  35. ^ "Photomask Technology + EUV Lithography awards". spie.org. Retrieved 2025-04-14.
  36. ^ SPIE PM08 (November 5, 2008). "SPIE PM08". SPIE.{{cite journal}}: CS1 maint: numeric names: authors list (link)
  37. ^ Kelley, Beth (December 31, 2009). "Advanced Lithography". spie.org. Retrieved 2025-10-21.
  38. ^ Kelley, Beth (December 31, 2009). "Advanced Lithography". SPIE.
  39. ^ "Hopkins honored with 2009 Bacus Lifetime Achievement Award - News". Compound Semiconductor. Retrieved 2026-06-02.
  40. ^ "News". spie.org. September 30, 2010. Retrieved 2025-10-21.
  41. ^ "In memoriam: Rich Larson". spie.org. Retrieved 2025-05-09.
  42. ^ a b SPIE. "Industry Leaders Drive SPIE Photomask Technology Conference". www.prweb.com. Retrieved 2025-05-09.
  43. ^ a b Cicero, Diogenes (2014-10-06). "Photomask Technology speaker says EUV is nearly production-ready | Semiconductor Digest". Retrieved 2025-07-07.
  44. ^ a b c d e "BACUS News". spie.org. Retrieved 2025-04-10.
  45. ^ "Oral History Interview: Ken Rygler | SEMI". www.semi.org. Retrieved 2025-08-11.
  46. ^ "Ken Rygler receives 2021 Bacus Lifetime Achievement award". spie.org. Retrieved 2025-06-09.
  47. ^ ims-admin-2024 (2024-10-22). "BACUS 2024 Lifetime Achievement Award for IMS Co-Founder Hans Loeschner". IMS Nanofabrication GmbH. Retrieved 2025-06-09.{{cite web}}: CS1 maint: numeric names: authors list (link)
  48. ^ "Oral History Interview: Shoichiro Yoshida | SEMI". www.semi.org. Retrieved 2026-06-01.
  49. ^ "Lasertec Receives "BACUS Prize" and "Best Paper Presentation Award" at SPIE Photomask Technology + EUVL Exhibition 2023". Lasertec Corporation. Retrieved 2026-06-01.
  50. ^ a b "Lasertec Receives "BACUS Prize" and "Best Paper Presentation Award" at SPIE Photomask Technology + EUVL Exhibition 2023". Lasertec Corporation. Retrieved 2025-06-05.
  51. ^ "Petersen Advanced Lithography". www.advlitho.com. Retrieved 2026-06-01.
  52. ^ "Lithography Papers - Chris Mack". www.lithoguru.com. Retrieved 2026-06-01.
  53. ^ "UCSD VLSI CAD Laboratory". vlsicad.ucsd.edu. Retrieved 2026-06-01.
  54. ^ SPIE. "Wafer plane inspection evaluated for photomask production". SPIE.
  55. ^ SPIE. "Development and Characterization of a Thinner Binary Mask Absorber for 22 nm node and Beyond" (PDF). SPIE.
  56. ^ SPIE. "Development and Characterization of a Thinner Binary Mask Absorber for 22 nm node and Beyond" (PDF). SPIE.
  57. ^ SPIE. "Future Mask Writers Requirements for the Sub 10 nm Node Era" (PDF). SPIE.
  58. ^ SPIE. "Mask Data Processing in the Era of Multibeam Writers" (PDF). SPIE.
  59. ^ "Fabrication of a full size EUV pellicle based on silicon nitride" (PDF). SPIE.
  60. ^ "KNI Collaborators Win Two Awards at 2018 SPIE Photomask Technology + EUV Lithography Conference". The Kavli Nanoscience Institute. 2018-10-12. Retrieved 2025-06-19.
  61. ^ SPIE. "Characterization of mask CD mean-to-target for hotspot patterns by using SEM image contours" (PDF). SPIE.
  62. ^ SPIE. "You Don't Need 1nm Contours for Curvilinear Shapes: Pixel-Based Computing is the Answer". SPIE.
  63. ^ "SPIE Digital Library Photomask Technology Proceedings". www.spiedigitallibrary.org. Retrieved 2025-06-05.
  64. ^ "Connecting climate with photomasks: Using skills for good | Electro Optics". www.electrooptics.com. Retrieved 2025-06-19.
  65. ^ "Meet us at Bacus Photomask Technology 2024 in Monterey, CA". www.vistec-semi.com. 2024-09-24. Retrieved 2025-06-05.

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